Ali Moballegh

Staff Process Engineer at Intel Corporation

Based in Portland, United States

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Seniority

Staff

Department

Engineering

Location

Portland

Industry

Semiconductor Manufacturing

Company size

110K

Contact information

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Email

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a•••••••@intel.com

Phone

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Background

About Ali Moballegh

10+ years experience in electroceramic and semiconductor material development, characterization and analysis. • 2+ years experience in Emerging Memory process development and integration technologies. • 10+ journal paper & conference publications with 300+ Citations. He received his Ph.D. in Material Science and Engineering from NC State University in January 2015. He is a Thin Film Process Development Engineer (PECVD, CVD and Diffusion) at Micron Technology since Oct. During my postdoc and PhD I have been mainly focusing on understanding the nature and mechanisms of resistance degradation and dielectric breakdown influenced by the electric field induced point defect redistribution in metal oxides. I well-studied and modeled drift and diffusion of ionic spices in the bulk and at the electrode interface, local microchemistry and microstructure as a subsequence of the degradation process. I have obtained extensive academic experiences in synthesis, characterization and application of electroceramic materials, complex metal oxides and advanced nanostructured materials.

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