Arno Bleeker

Background

About Arno Bleeker

Experienced researcher and systems engineer in professional equipment industry. Ever since my graduation I have worked at the forefront of technology, first in electron microscopy now in semiconductor lithography. My interest lays not only in the purely technology side of product development: Marketing, product positioning, market potential and customer contacts have been a large part of my activities. During my career at ASML I have been involved in the development of a number of new, ground breaking technologies. Most of these projects involved the cooperation between multiple companies, universities and research centers in multiple countries. Managing these kind of project has always been exciting for me. During the turn of the century I spend two years at Lucent Bell Labs as an expat for ASML to develop the Scalpel technology together with Lucent and Applied Materials. The project also involved SSG (USA) Zeiss (germany), TNO (the Netherlands) and MEBS (UK). After the Scalpel project I worked several years on Maskless Lithography, a project together with Micronic (Sweden), TNO( The Netherlands), FhG (Germany) and IMEC (Belgium). The optical design was done by ASML Wilton (USA). Besides the technical development I was actively involved in the marketing effort visiting customers and defining introduction strategies. Building on my experience I was a member of the ASML taskforce that laid down the fundamentals what later became "Holistic Lithography" Currently I am the systems engineer for the CO2 laser development for the EUV technology. This involves developments in cooperation with both Trumpf (Germany) and ASML/Cymer (San Diego) I hold about 80 patents in the field of lithography. Specialties: competitive new technologies analysis, creative new technology development,hi-tech marketing