Jane Oreilly

Background

About Jane Oreilly

I am currently a Senior Process Engineer at Intel, Leixlip, specializing in ion implantation and rapid thermal processing (RTP) within advanced semiconductor manufacturing. With a strong foundation in physics and materials science, I hold a bachelor's degree in Physics and Chemistry of Advanced Materials from Trinity College Dublin (2009) and a PhD in Physics, completed in February 2018. My doctoral research led to the development of a novel ferro/ferrimagnetic resonance (FMR) detection method using SQUID magnetometry, with findings published in Review of Scientific Instruments (RSI). Over the years, I have honed a wide range of technical skills: RF and Microwave Techniques: Expertise in VNA, TDR, waveguide design and fabrication, CST simulation (Microwave Studio), PCB fabrication, and EMI testing. Magnetometry: Skilled in SQUID magnetometry, FMR, and vibrating sample magnetometry (VSM). Semiconductor Fabrication and Testing: Proficient in thermal and chemical oxidation, RTP, Ion implant, etching (HF and ICP), photolithography, physical vapor deposition (PVD), reliability testing, and breakdown modeling. My multidisciplinary background allows me to bridge the gap between research and industrial applications, driving innovation in semiconductor processes and advanced material characterization. Always curious and solutions-focused, I thrive in challenging environments that require both technical expertise and creative problem-solving. Let’s connect to discuss cutting-edge developments in semiconductor technology, advanced materials, or RF and microwave systems!